Sputtering Components Japan Co., Ltd.'s Company Profile and Products


Sputtering Components Japan Co., Ltd.

  • Japan
Sputtering Components Japan Co., Ltd. Website

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Profile

Country Japan
Website Sputtering Components Japan Co., Ltd. Website

Products Handled By Sputtering Components Japan Co., Ltd.

99 registered products of Sputtering Components Japan Co., Ltd.


Sputtering Components Japan Co., Ltd.

Rotary cathode drop-in type end block

■By switching from a conventional planar cathode to a rotary cathode, you can expect the following benefits. ・Improved target ...


4 models listed

Sputtering Components Japan Co., Ltd.

Rotary cathode Drop-in swing cathode

■By switching from a conventional planar cathode to a rotary cathode, you can expect the following benefits. ・Improved target ...


1 model listed

Sputtering Components Japan Co., Ltd.

Rotary cathode Drop-in cathode for small diameter targets

■By switching from a conventional planar cathode to a rotary cathode, you can expect the following benefits. ・Improved target ...


1 model listed

Sputtering Components Japan Co., Ltd.

Rotary cathode Special rotary cathode for omnidirectional film formation

■By switching from a conventional planar cathode to a rotary cathode, you can expect the following benefits. ・Improved target ...


1 model listed

Sputtering Components Japan Co., Ltd.

Rotary cathode side mount type end block

■By switching from a conventional planar cathode to a rotary cathode, you can expect the following benefits. ・Improved target ...


4 models listed

Sputtering Components Japan Co., Ltd.

Rotary cathode Special rotary cathode for RF power supply

■By switching from a conventional planar cathode to a rotary cathode, you can expect the following benefits. ・Improved target ...


1 model listed

Sputtering Components Japan Co., Ltd.

Rotary cathode magnet bar

■By switching from a conventional planar cathode to a rotary cathode, you can expect the following benefits. ・Improved target ...


3 models listed

Sputtering Components Japan Co., Ltd.

Rotary cathode Magnet bar RAM bar

■By switching from a conventional planar cathode to a rotary cathode, you can expect the following benefits. ・Improved target ...


1 model listed

Sputtering Components Japan Co., Ltd.

Rotary cathode Strong magnetic field magnet bar for ferromagnetic materials such as Ni

■By switching from a conventional planar cathode to a rotary cathode, you can expect the following benefits. ・Improved target ...


1 model listed

Sputtering Components Japan Co., Ltd.

Rotary cathode gas bar

■By switching from a conventional planar cathode to a rotary cathode, you can expect the following benefits. ・Improved target ...


3 models listed

Sputtering Components Japan Co., Ltd.

Research Equipment Powder Dispenser with Grinding Function

The powder dispenser PCD-1, which has the ability to crush solid materials, crushes a preset amount with high precision and hig...


1 model listed

Sputtering Components Japan Co., Ltd.

Research Equipment Powder Dispenser

The SDM-1 powder dispenser manufactured by XQ Instruments in Singapore dispenses a predefined amount of powder with high accura...


1 model listed

Sputtering Components Japan Co., Ltd.

Research Equipment Microtube Capper Decapper

The test tube capper/decapper MCD-13 reduces the burden of attaching and removing screw caps on microtubes. Since there is no n...


1 model listed

Sputtering Components Japan Co., Ltd.

Research Equipment Desktop Powder Dispenser

With high precision and high reproducibility, it is possible to dispense powder in preset amounts (and multiples thereof). Labo...


2 models listed

Sputtering Components Japan Co., Ltd.

Research Equipment Portable Powder Dispenser

■Summary With the portable powder dispenser SDH-1, if you set the dispensing amount in advance, you can dispense that amount or...


1 model listed

Sputtering Components Japan Co., Ltd.

Research equipment Microtube automatic capper

■Features ・Automates the attachment of screw caps to microtubes with a diameter of 13 mm. Patented. ・In addition to the 13mm ...


2 models listed

Sputtering Components Japan Co., Ltd.

Resistance measuring device Non-contact sheet resistance measuring device

■Features ・Measures the sheet resistance of conductive materials ・Non-contact type allows measurement without damaging the ta...


1 model listed

Sputtering Components Japan Co., Ltd.

Resistance measuring device Non-contact resistance measuring device

■Features ・Demo machines can be rented. Please feel free to contact us. ・Both in-line measurement in vacuum and desktop measu...


1 model listed

Sputtering Components Japan Co., Ltd.

Target Silicon (Si) powder For target For lithium ion battery negative electrode

■Product name Silicon (Si) powder ■Manufacturer China・Fuzhou Yinrich Metallurgical Materials Co., Ltd ■Application 1 sputter...


1 model listed

Sputtering Components Japan Co., Ltd.

Target High purity cylindrical Si (silicon) single crystal sputtering target

■Features ・Cylindrical single-crystal Si (silicon) sputtering targets are manufactured using the Czochralski method (CZ method...


1 model listed

Sputtering Components Japan Co., Ltd.

Target High purity cylindrical Cu (copper) sputtering target

■Features ・We manufacture cylindrical Cu (copper) targets with a diameter of up to 163mm (Note 1) using monolithic (extrusion ...


1 model listed

Sputtering Components Japan Co., Ltd.

Sputter power supply DC power supply for ion source

A power supply specially designed for ion sources. Voltage outputs and capacities other than those specified can be customized ...


9 models listed

Sputtering Components Japan Co., Ltd.

Sputter power supply Pulse generator Bipolar pulse generator HXB series 90kW-140kW

MF/Bipolar Pulse Generators HXB900 to HXB1400 provide large output, compact design, and fast arc control in one cabinet. This b...


4 models listed

Sputtering Components Japan Co., Ltd.

Sputter power supply pulse generator bipolar pulse generator SB series 15kW-35kW

This pulse generator can be used for both symmetrical MFAC current replacement and bipolar pulsing to form asymmetrical rectang...


2 models listed

Sputtering Components Japan Co., Ltd.

Sputter power supply Pulse generator Unipolar pulse generator HXD series 90kW-HXD140kW

If you are looking for high power, easy operation, and stable processes, using HXD901-HXD1401 is the easiest solution. The modu...


4 models listed

Sputtering Components Japan Co., Ltd.

Sputter power supply Pulse generator Unipolar pulse generator SD series 15kW-35kW

When combined with ADL's DC power supply, the SD151/SD301 and SD351 generate unipolar pulses with reverse pulses for faster dis...


4 models listed

Sputtering Components Japan Co., Ltd.

Unipolar pulse generator SD series 3kW-30kW

This pulse generator generates unipolar pulses in conjunction with an ADL DC power supply. ADL's pulse generator is fixed at 20...


3 models listed

Sputtering Components Japan Co., Ltd.

Water-cooled sputter DC power supply HX series 90kW-140kW

For non-reactive processes, models HX900 to HX1400 are extremely reliable and economical power supplies. It is possible to flex...


4 models listed

Sputtering Components Japan Co., Ltd.

Water-cooled sputter DC power supply HXF series 15kW-30kW

HXF was developed specifically for sensitive and damage-prone deposition applications. Its fully automatic arc control system s...


6 models listed

Sputtering Components Japan Co., Ltd.

Water-cooled sputter DC power supply HX series 15kW-35kW

The extremely compact design, with a width of 218 mm and a height of 222 mm, does not require a special cabinet and can be inte...


10 models listed

Sputtering Components Japan Co., Ltd.

Water-cooled sputter DC power supply GSW series 10kW-30kW

The GSW series can be connected in parallel and the output can be expanded up to 240kW. A special circuit design eliminates the...


10 models listed

Sputtering Components Japan Co., Ltd.

Spectral and pulse monitoring system EMICON SA-HIPIMS

EMICON SA-HIPIMS" is an upgraded model of "EMICON SA" with a particular focus on the HIPIMS process. During film formation, pul...


1 model listed

Sputtering Components Japan Co., Ltd.

PEM monitor EMICON SA

■Features ・Many achievements with SCI rotary cathodes ・It is possible to improve the deposition rate by up to 3 times (e.g. r...


1 model listed

Sputtering Components Japan Co., Ltd.

ICP plasma source COPRA

This is an ICP type plasma source manufactured by CCR in Germany. Almost all equipment manufacturers in Europe use it as their ...


7 models listed

Sputtering Components Japan Co., Ltd.

PECVD COPRA Linear Sources for large substrates

■Features ・Less substrate damage because ion energy does not increase in proportion to power level ・The applicable vacuum ran...


1 model listed

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