High-speed laser defect scanner AT series for substrates-AT1
High-speed laser defect scanner AT series for substrates-Japan Laser Co., Ltd.

High-speed laser defect scanner AT series for substrates
Japan Laser Co., Ltd.


About This Product

Lumina Instruments' AT Series is an optical inspection system that performs full-surface defect detection, mapping, classification, and review of transparent, translucent, and opaque substrates. Utilizing four simultaneously operating detection channels and Lumina's proprietary detection technology, it enhances yield control and process management for semiconductor substrates and high-tech glass substrates. Although it is a laser scanning method, it is extremely fast and can mount substrates of various sizes, shapes, and thicknesses. ■High-speed defect imaging system AT series features ・Laser scanning type (non-rotating type) ・Can inspect rectangular, thin, warped, and specially shaped boards ・Subnanometer scale membrane defects ・Detection and classification of defects ・Compatible with transparent and opaque substrates ・Maximum sample size 300mm x 300mm ■Function ・Defect Map: Color-coded display according to defect type ・Pareto Chart: Defect type and total number ・Defect Summary: Binning and grouping of defects based on defect size and film thickness ・Report: Report defect type, location, length, size, etc. (CSV format) ・Zoom: Display and review the specified defect as an image

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    High-speed laser defect scanner AT series for substrates

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2 Models of High-speed laser defect scanner AT series for substrates

Items marked with have different values depending on the model number.

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Product Image Part Number Price (excluding tax) Automatic machine model Maximum board size Mounting board thickness PSL particle sensitivity Scan speed 150mm/200mm/300mm
High-speed laser defect scanner AT series for substrates-Part Number-AT1

AT1

Available upon quote AT1-AUTO
Open cassette method
200mm wafer
300x300mm 0.1-5mm 100nm (on silicon)
150nm (on glass)
225s/440s/970s
High-speed laser defect scanner AT series for substrates-Part Number-AT2

AT2

Available upon quote AT2-EFEM
EFEM method
300mm wafer
450x450mm 0.1-5mm 200nm (on silicon)
300nm (on glass)
60s/75s/150s

Click on the part number for more information about each product

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