Negative powder resist H-SiOx for electron beam lithography equipment, EUV exposure equipment, and nanoimprint lithography
Opt Sirius Co., Ltd.
About This Product
■Characteristics unique to powder resists
・Long-term storage is possible…1 year storage period
・You can always use the same viscosity...Since it is mixed with a solvent before use, it will not thicken.
・You can create films with a wide range of thickness...You can adjust the viscosity.
・Film thickness of 5nm, resolution of 7nm...Achieved through the latest tests
・You can reduce the amount of waste...It can be stored for a long time and can be purchased in small quantities.
・Solid support system…Supported by AQM, a company with a wealth of experience
・Excellent LER (Line Edge Roughness)
・Resistance to strong dry etching
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Product
Negative powder resist H-SiOx for electron beam lithography equipment, EUV exposure equipment, and nanoimprint lithography
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Handling Company
Opt Sirius Co., Ltd.
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Categories
1 Models of Negative powder resist H-SiOx for electron beam lithography equipment, EUV exposure equipment, and nanoimprint lithography
| Product Image | Part Number | Price (excluding tax) |
|---|---|---|
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H-SiOx |
Available upon quote |
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About Company Handling This Product
- Japan